电子工业用气体统称为电子气。在大规模集成电路（lsi）、超大规模集成电路（vlsi）、半导体和电子器件生产与加工过程中，电子气主要用于气相外延生长、化学气相淀积、掺杂（杂质扩散）、蚀刻、离子注入、溅射、退火、系统加压、洁净吹扫、吸气覆盖、氧化和还原等工艺。其中部分气体直接作为半导体源，如硅源、硼源、磷源和cvd 源等等。
oxygen in tetrafluoromethane
4% o2/cf4
8% o2/cf4
17.5% o2/cf4
standard valve outlet cga580
other diss cga connections are avaliable upon request.
phosphine in argon
1.0% ph3/ar
2.0% ph3/ar
5.0% ph3/ar
10.0% ph3/ar
15.0% ph3/ar
standard valve outlet cga350
manual and pneumatic diss cga connections are avaliable upon request.
phosphine in helium
1.0% ph3/he
2.0% ph3/he
10.0% ph3/he
standard valve outlet cga350
manual and pneumatic diss cga connections are avaliable upon request.
phosphine in hydrogen
1.0% ph3/h2
5.0% ph3/h2
10.0% ph3/h2
15.0% ph3/h2
standard valve outlet cga350
manual and pneumatic diss cga connections are avaliable upon request.
phosphine in nitrogen
1.0% ph3/n2
2.0% ph3/n2
3.0% ph3/n2
4.0% ph3/n2
5.0% ph3/n2
10.0% ph3/n2
15.0% ph3/n2
standard valve outlet cga350
manual and pneumatic diss cga connections are avaliable upon request.
silane in argon
1.0% sih4/ar
2.0% sih4/ar
3.0% sih4/ar
4.0% sih4/ar
5.0% sih4/ar
10.0% sih4/ar
standard valve outlet cga350
manual and pneumatic diss cga connections are avaliable upon request.
silane in hydrogen
1.0% sih4/h2
2.0% sih4/h2
3.0% sih4/h2
4.0% sih4/h2
5.0% sih4/h2
10.0% sih4/h2
standard valve outlet cga350
manual and pneumatic diss cga connections are avaliable upon request.
silane in nitrogen
1.0% sih4/n2
2.0% sih4/n2
3.0% sih4/n2
4.0% sih4/h2
5.0% sih4/n2
10.0% sih4/n2
20.0% sih4/n2
standard valve outlet cga350
manual and pneumatic diss cga connections are avaliable upon request.
